Noncontact measurement of film thickness by the photothermal deflection method

Haruo Fujimori, Yamato Asakura, Kazumichi Suzuki, Shunsuke Uchida

Research output: Contribution to journalArticlepeer-review

14 Scopus citations

Abstract

A noncontact film-thickness measurement method using photothermal deflection was studied from theoretical and experimental results of the film-thickness dependency of the deflection amplitude. The calculated results showed that thicknesses in a range from the skin depth to the thermal-diffusion length of an opaque film could be determined from the deflection amplitude, which increased monotonously in that range. It was shown that the thicknesses of a transparent film could be determined from the vibrational structure of the deflection amplitude due to an interference effect of the excitation beam or from its decrease by an adiabatic effect of the film. Experimental results for NiO films (3-38 m) and SiO2 films (20-110 nm) revealed the possibility of noncontact film-thickness measurements in air and water.

Original languageEnglish (US)
Pages (from-to)1759-1764
Number of pages6
JournalJapanese Journal of Applied Physics
Volume26
Issue number10 R
DOIs
StatePublished - Oct 1987

ASJC Scopus subject areas

  • General Engineering
  • General Physics and Astronomy

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