Abstract
We describe a theoretical approach to transport and a potentially valuable scheme for screening gate dielectric materials. Realistic structural models of the Si-dielectric interface are employed for (formula presented) model metal-oxide–semiconductor (MOS) structures. The leakage current for a 1.02-nm MOS structure is calculated from first principles using Landauer’s ballistic transport approach and ab inito molecular-dynamic simulation. The calculated leakage currents agree with most recent experimental data.
Original language | English (US) |
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Journal | Physical Review B - Condensed Matter and Materials Physics |
Volume | 64 |
Issue number | 12 |
DOIs | |
State | Published - 2001 |
Externally published | Yes |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics